Work function stability of thermal ALD Ta(Si)N gate electrodes on HfO 2

1. Hooker, J.C.
2. Perez, N.
3. Alen, P.
4. Ritala, M.
5. Leskelä, M.
6. Roozeboom, F.
7. Van Berkum, J.G.M.
8. Naburgh, E.P.
9. Van Den Heuvel, F.C.
10. Maes, J.W.