Real-time X-ray diffraction imaging for semiconductor wafer metrology and high temperature in situ experiments

  1. Danilewsky, A.N.
  2. Wittge, J.
  3. Hess, A.
  4. Cröll, A.
  5. Rack, A.
  6. Allen, D.
  7. McNally, P.
  8. Dos Santos Rolo, T.
  9. Vagovič, P.
  10. Baumbach, T.
  11. Garagorri, J.
  12. Elizalde, M.R.
  13. Tanner, B.K.
Revista:
Physica Status Solidi (A) Applications and Materials Science

ISSN: 1862-6300 1862-6319

Any de publicació: 2011

Volum: 208

Número: 11

Pàgines: 2499-2504

Tipus: Article

DOI: 10.1002/PSSA.201184264 GOOGLE SCHOLAR