Real-time X-ray diffraction imaging for semiconductor wafer metrology and high temperature in situ experiments

  1. Danilewsky, A.N.
  2. Wittge, J.
  3. Hess, A.
  4. Cröll, A.
  5. Rack, A.
  6. Allen, D.
  7. McNally, P.
  8. Dos Santos Rolo, T.
  9. Vagovič, P.
  10. Baumbach, T.
  11. Garagorri, J.
  12. Elizalde, M.R.
  13. Tanner, B.K.
Journal:
Physica Status Solidi (A) Applications and Materials Science

ISSN: 1862-6300 1862-6319

Year of publication: 2011

Volume: 208

Issue: 11

Pages: 2499-2504

Type: Article

DOI: 10.1002/PSSA.201184264 GOOGLE SCHOLAR