F. Roozeboom-rekin lankidetzan egindako argitalpenak (2)

2004

  1. Ru and RuO2 gate electrodes for advanced CMOS technology

    Materials Science and Engineering B: Solid-State Materials for Advanced Technology

  2. Work function stability of thermal ALD Ta(Si)N gate electrodes on HfO 2

    ESSCIRC 2004 - Proceedings of the 34th European Solid-State Device Research Conference