Interuniversity Microelectronics Centre-ko ikertzaileekin lankidetzan egindako argitalpenak (3)

2006

  1. Extent of plasma damage to porous organosilicate films characterized with nanoindentation, x-ray reflectivity, and surface acoustic waves

    Journal of Materials Research, Vol. 21, Núm. 12, pp. 3161-3167

  2. Use of nanoindentation to characterise the plasma damage region in low-k dielectric films

    American Society of Mechanical Engineers, Applied Mechanics Division, AMD

  3. Use of nanoindentation to characterise the plasma damage region in low-k dielectric films

    American Society of Mechanical Engineers, Applied Mechanics Division, AMD