Ru and RuO2 gate electrodes for advanced CMOS technology

  1. Fröhlich, K.
  2. Husekova, K.
  3. Machajdik, D.
  4. Hooker, J.C.
  5. Perez, N.
  6. Fanciulli, M.
  7. Ferrari, S.
  8. Wiemer, C.
  9. Dimoulas, A.
  10. Vellianitis, G.
  11. Roozeboom, F.
Journal:
Materials Science and Engineering B: Solid-State Materials for Advanced Technology

ISSN: 0921-5107

Year of publication: 2004

Volume: 109

Issue: 1-3

Pages: 117-121

Type: Conference paper

DOI: 10.1016/J.MSEB.2003.10.061 GOOGLE SCHOLAR
Data source: Scopus