Ibon
Ocaña Arizcorreta
Investigador Principal
José Manuel
Martínez Esnaola
Investigador Principal Senior
Publicacions en què col·labora amb José Manuel Martínez Esnaola (21)
2014
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"in-situ" mechanical characterisation of WC-Co hardmetals using microbeam testing
International Journal of Refractory Metals and Hard Materials, Vol. 43, pp. 236-240
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Assessment of fracture and elastoplastic properties of thin and very thin films
AIP Conference Proceedings
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Assessment of mechanical properties of metallic thin-films through micro-beam testing
Thin Solid Films
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Damage induced in interconnect structures mimicking stresses during flip chip packaging
International Conference and Exhibition on Device Packaging 2014
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Fracture characterization of brittle thin-films by membrane testing
Thin Solid Films, Vol. 564, pp. 314-320
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Fracture characterization of thin-films by dual tip indentation
Acta Materialia, Vol. 71, pp. 44-55
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Micro beam testing: A new method for the mechanical characterization WC-Co hardmetals
Advances in Tungsten, Refractory and Hardmaterials IX - Proceedings of the 9th International Conference on Tungsten, Refractory and Hardmaterials
2013
2010
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Damage induced in interconnect structures mimicking stresses during flip chip packaging
AIP Conference Proceedings
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Use of electronic speckle pattern interferometry in the detection of fatigue failure in high strength steels
Engineering Failure Analysis, Vol. 17, Núm. 1, pp. 226-235
2007
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Adhesion studies in integrated circuit interconnect structures
Engineering Failure Analysis, Vol. 14, Núm. 2, pp. 349-354
2006
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Adhesion studies in low-k interconnects using cross sectional nanoindentation
AIP Conference Proceedings
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Fracture characterization in patterned thin films by cross-sectional nanoindentation
Acta Materialia, Vol. 54, Núm. 13, pp. 3453-3462
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Simulation of cross-sectional nanoindentation in interconnect structures with cohesive elements
Fracture of Nano and Engineering Materials and Structures - Proceedings of the 16th European Conference of Fracture
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Use of nanoindentation to characterise the plasma damage region in low-k dielectric films
American Society of Mechanical Engineers, Applied Mechanics Division, AMD
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Use of nanoindentation to characterise the plasma damage region in low-k dielectric films
American Society of Mechanical Engineers, Applied Mechanics Division, AMD
2005
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A new technique for the characterization of the adhesion in integrated circuit interconnect structures
Materials Research Society Symposium Proceedings
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A new technique for the characterization of the adhesion in integrated circuit interconnect structures
11th International Conference on Fracture 2005, ICF11
2003
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High temperature tensile and fatigue behaviour of the unidirectionally reinforced MMC Ti64/SiC
Engineering Fracture Mechanics, Vol. 70, Núm. 15, pp. 2137-2148
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Standard surface defects produced by water vapour oxidation in steels used in fossil fuel fired power plants
Materials Science and Engineering A, Vol. 342, Núm. 1-2, pp. 1-10