Quality inspection of nanoscale patterns produced by laser interference lithography using image analysis techniques

  1. Ji, Z.
  2. Zhang, J.
  3. Peng, C.
  4. Tan, C.
  5. Olaizola, S.M.
  6. Berthou, T.
  7. Tisserand, S.
  8. Verevkin, Y.K.
  9. Wang, Z.
Actas:
2009 IEEE International Conference on Mechatronics and Automation, ICMA 2009

ISBN: 9781424426935

Ano de publicación: 2009

Páxinas: 1835-1840

Tipo: Achega congreso

DOI: 10.1109/ICMA.2009.5246458 GOOGLE SCHOLAR
Fonte de datos: Scopus