High-power laser interference lithography process on photoresist: Effect of laser fluence and polarisation

  1. Ellman, M.
  2. Rodríguez, A.
  3. Pérez, N.
  4. Echeverria, M.
  5. Verevkin, Y.K.
  6. Peng, C.S.
  7. Berthou, T.
  8. Wang, Z.
  9. Olaizola, S.M.
  10. Ayerdi, I.
Journal:
Applied Surface Science

ISSN: 0169-4332

Year of publication: 2009

Volume: 255

Issue: 10

Pages: 5537-5541

Type: Article

DOI: 10.1016/J.APSUSC.2008.07.201 GOOGLE SCHOLAR
Data source: Scopus