High-power laser interference lithography process on photoresist: Effect of laser fluence and polarisation
- Ellman, M.
- Rodríguez, A.
- Pérez, N.
- Echeverria, M.
- Verevkin, Y.K.
- Peng, C.S.
- Berthou, T.
- Wang, Z.
- Olaizola, S.M.
- Ayerdi, I.
ISSN: 0169-4332
Année de publication: 2009
Volumen: 255
Número: 10
Pages: 5537-5541
Type: Article