Thermal slip sources at the extremity and bevel edge of silicon wafers

  1. Tanner, B.K.
  2. Wittge, J.
  3. Allen, D.
  4. Fossati, M.C.
  5. Danilwesky, A.N.
  6. McNally, P.
  7. Garagorri, J.
  8. Elizalde, M.R.
  9. Jacques, D.
Revue:
Journal of Applied Crystallography

ISSN: 0021-8898 1600-5767

Année de publication: 2011

Volumen: 44

Número: 3

Pages: 489-494

Type: Article

DOI: 10.1107/S0021889811012088 GOOGLE SCHOLAR